OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...

Si2 announced that Cadence has donated extensions to the OpenAccess community which enable physical design tools to represent Multi-Patterned Technology (MPT). Conventional photolithography cannot ...

Advances in GPU computing and multi-beam mask writing are removing constraints to enable entirely curvilinear masks.

As DRAM technologies scale to increasingly tighter pitches, the patterning requirements exceed the limits of conventional ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

With the ongoing US-China tensions, Huawei exemplified its ability to make 7nm chips without EUV equipment, and chip guru Burn Lin believes it's not surprising for Huawei to achieve the milestone, but ...

When we talk about computing these days, we tend to talk about software and the engineers who write it. But we wouldn’t be anywhere without the hardware and the physical sciences that have enabled it ...