LONDON — Deep reactive ion etching of silicon is being offered as a service by QinetiQ, the spin-out from Britain's Defence Evaluation Research Agency, and as one part of a micro-electro-mechanical ...
Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...
Veeco Instruments Inc. has announced that École Polytechnique Fédérale de Lausanne (EPFL), one of Europe’s top technical universities, has ordered a NEXUS® Ion Beam Etch (IBE) System. The system will ...
MOORESTOWN, N.J., Feb. 10, 2023 /PRNewswire/ -- Denton Vacuum LLC announced today that they have won a third order for the Infinity FA failure analysis system from a leading global semiconductor ...
Like sandblasting at the nanometer scale, focused beams of ions ablate hard materials to form intricate three-dimensional patterns. The beams can create tiny features in the lateral dimensions—length ...
The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...
Dutch researcher Michiel Blauw has described the physical limitations of the plasma-etching of deep, narrow microstructures in silicon. His results have led to such an improvement in the etching ...
Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...
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